Baking system for plasma display panel and layout method for said system
US6998578B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 24, 2003 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | Jan 22, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2217/491
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A baking system for a plasma display panel which comprises a clean room 1 and a baking furnace having an upper passage 11 for conveying a plasma display panel glass substrate 5 during baking from an inlet 15 of the furnace 3, and a lower passage 13 for conveying the baked substrate 5 in the upper passage 11 towards an outlet of the furnace 3, both of the inlet and the outlet being provided at the same end of the furnace 3, characterized in that only the inlet 15 and the outlet 17 are connected to a clean room 1, while keeping a body thereof outside the clean room 1. Also, there is disclosed a layout method for such a baking system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.