Reticle defect detection using simulation
US6999611B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 1999 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | Oct 22, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Defects are detected in a reticle used in integrated circuit chip fabrication by obtaining digital image data corresponding to an image of the reticle. Typically, this is accomplished by scanning the reticle using a laser scanner. The digital image data are then processed according to predetermined criteria to identify defects. Such processing may include, for example, processing the digital image data in comparison to reference digital image data for the same or a similar portion of the reticle. Next, a response that would be produced if the reticle were to be utilized in a photolithographic system is simulated by processing the digital image data corresponding to the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.