Process for the preparation of metal-containing nanostructured films
US7001669B2 · kind B2 · utility
33Cited by
18References
3Claims
0Family size
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Key dates
| Filing date | Dec 23, 2002 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | May 5, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249953
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Metal-containing nanostructured films are prepared by electrodepositing a metal-containing composition within the pores of a mesoporous silica template to form a metal-containing silica nanocomposite. The nanocomposite is annealed to strengthen the deposited metal-containing composition. The silica is then removed from the nanocomposite, e.g., by dissolving the silica in an etching solution to provide a self-supporting metal-containing nanostructured film. The nanostructured films have a nanowire or nanomesh architecture depending on the pore structure of the mesoporous silica template used to prepare the films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.