Method of drawing a pattern on a base material by scanning a beam
US7001709B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Jul 15, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/0734
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam source and the base material to scan the beam on a second pattern-drawn field located next to the first pattern-drawn field in such a way that a boundary between the first pattern-drawn field and the second pattern-drawn field is positioned at a joint portion between a slope portion and a side wall portion of the ring-shaped zones; and drawing the pattern on the second pattern-drawn field by scanning a beam so that the joint portion between the slope portion and the side wall portion is drawn at the boundary between the first pattern-drawn field and the second pattern-drawn field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.