Cobalt imprinted polymer composition for selective removal of cobalt, process for preparation thereof, and process for removal of cobalt
US7001963B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2004 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Nov 1, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2101/20
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
The present invention provides a polymer composition for the selective removal of cobalt, a process for the preparation thereof and the process for removal of cobalt, using the said polymer composition. More particularly it relates to a cross-linked polymer composition prepared by the molecular imprinting technique. The preparation of the cross linked polymer involves selection of vinyl monomers bearing functional groups that bind to cobalt, formation of a complex of these monomers with cobalt and subsequent polymerization of the complex in presence of a crosslinker. The process for the removal of cobalt comprises treating the solution containing a mixture of cobalt and other metal ions with the polymer under conditions sufficient for cobalt to form a complex with the polymer and separating the polymer from the cobalt depleted solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.