Film deposition apparatus and film deposition method
US7005047B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2003 |
| Grant date | Feb 28, 2006 |
| Priority date | — |
| Expiry date | Oct 23, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A particle film deposition apparatus and method are provided, with which ultra fine particles are generated by arc heating. The generated ultra fine particles can be efficiently sucked up into a transfer tube regardless of an arc voltage, and the resulting film can be stable in shape. An evaporation material 8 to be evaporated by arc heating and to generate ultra fine particles is connected to an electrode. As other electrodes, a plurality of rods 17 each having a discharge section at the tip thereof are provided. These rods 17 are so arranged as to be directed in each different direction with respect to the evaporation material 8.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.