System and method for pattern identification
US7006694B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2000 |
| Grant date | Feb 28, 2006 |
| Priority date | — |
| Expiry date | Mar 8, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/752
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method for pattern identification are disclosed. According to one embodiment of the present invention, the method for locating a pattern includes the steps of (1) providing a pattern image corresponding to the pattern to be located; (2) extracting a pattern contour from the pattern image; (3) generating vector information for the pattern contours, relative to a reference point; (4) creating a reference table for storing the vector information, the reference tables corresponding to the pattern contour; (5) providing a scene image, which will be searched for the pattern; (6) extracting a scene contour from the scene image; (7) generating vector information for the scene contours; and (8) determining whether the pattern has been located within the scene image using the reference table and the vector information for the scene contour. According to another embodiment, a system includes a first image capture device that captures a pattern image which includes an image of a pattern; a second image capture device that captures a scene image to be searched for the pattern; a processor for processing the images, which includes means for extracting at least one pattern contour fr…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.