Optical modeling method
US7006887B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 3, 2002 |
| Grant date | Feb 28, 2006 |
| Priority date | — |
| Expiry date | Feb 11, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y50/02
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention provides an optical modeling method capable of inhibiting distortion in an object to be modeled and modeling with higher precision. A square exposure region is divided into a plurality of pixels which are further divided into first and second pixel sub-groups, the first pixel sub-group is exposed such that neighboring pixels or more are not exposed at one time, and then unexposed pixels incorporated in the second pixel sub-group are exposed two neighboring pixels or more are not exposed at one time. A photo-curable resin is exposed twice, and then cured in an amount of one photo-curable resin layer. Accordingly, the neighboring pixels are not exposed at one time, the producing of curing shrinkage is limited within one pixel, and distortion due to the curing shrinkage does not spread to the pixels neighboring the one pixel, whereby distortion in the object to be modeled can be inhibited significantly, and modeling with higher precision is made possible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.