Processes for producing polysiloxanes and photoresist compositions comprising same
US7008750B2 · kind B2 · utility
1Cited by
16References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2003 |
| Grant date | Mar 7, 2006 |
| Priority date | — |
| Expiry date | Jul 11, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/108
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.