Optical position measuring system using an interference pattern
US7009713B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2003 |
| Grant date | Mar 7, 2006 |
| Priority date | — |
| Expiry date | Feb 27, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/228
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A position measuring system including a laser light source for radiating a laser beam, an optical lens system for generating an interference pattern on the basis of the laser beam having passed through different optical paths, a detector for detecting the interference pattern, and an arithmetic unit for calculating the position of at least one of the light source and the detector on the basis of a detection signal issued from the detector. For example, a spherical lens can be used as the optical lens system. In this case, the interference pattern is formed on the basis of spherical aberration of the lens. Alternatively, a multifocal lens may be used as the optical lens system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.