Phosphor thin film, preparation method, and EL panel
US7011896B2 · kind B2 · utility
6Cited by
21References
19Claims
0Family size
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Inventors
Key dates
| Filing date | Feb 5, 2003 |
| Grant date | Mar 14, 2006 |
| Priority date | — |
| Expiry date | Feb 5, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S428/917
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
In a phosphor thin film comprising a matrix material and a luminescence center, the matrix material has the compositional formula: MIIvAxByOzSw wherein MII is Zn, Cd or Hg, A is Mg, Ca, Sr, Ba or rare earth element, B is Al, Ga or In, and atomic ratios v, x, y, z and w are 0.005≦v≦5, 1≦x≦5, 1≦y≦15, 0<z≦30, and 0<w≦30. The phosphor thin film of quality is formed at low cost by a low-temperature process, enabling manufacture of full-color EL panels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.