Patent · US Expired

Methods of using and fabricating a supporting substrate for the deposition, automated recognition, and spectroscopic identification of particles

US7016034B2 · kind B2 · utility

5Cited by
2References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2005
Grant dateMar 21, 2006
Priority date
Expiry dateSep 19, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31678
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Methods of fabricating and using a supporting substrate for the deposition, automated recognition and spectroscopic identification of particulate impurities in liquid or gaseous media are disclosed wherein the supporting substrate comprises a filter membrane of polymer materials of a defined pore width, wherein the surface of the filter membrane is coated with metal which in the selected wavelength range for spectroscopic identification has no spectral features and at the selected excitation wavelength absorbs no or only little of the laser energy which is radiated in, and has a very smooth structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.