Lithography line width monitor reflecting chip-wide average feature size
US7016054B2 · kind B2 · utility
1Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2003 |
| Grant date | Mar 21, 2006 |
| Priority date | — |
| Expiry date | Nov 5, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.