Method of making a high reflectivity micro mirror and a micro mirror
US7016128B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Sep 1, 2004 |
| Grant date | Mar 21, 2006 |
| Priority date | — |
| Expiry date | Sep 1, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D7/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of making a high reflectivity micro mirror. A first step involves providing a monolithic bulk crystal silicon having an anisotropic body with a crystalline plane. A second step involves applying chemical agents to selectively remove a portion of the body overlying the crystalline plane to expose a portion of the crystalline plane. Crystalline planes that are present in monolithic bulk crystal silicon have an inherent smoothness which is on an atomic level. The underlying teaching of the present invention is that, instead of attempting to polish or otherwise smooth the surface of the silicon, one should merely expose all or a selected portion of the crystalline plane and use the exposed portion of the crystalline plane as a mirror surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.