System and method for X-ray generation
US7016470B2 · kind B2 · utility
10Cited by
7References
51Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2004 |
| Grant date | Mar 21, 2006 |
| Priority date | — |
| Expiry date | Mar 29, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a system for generating X-rays via the process of inverse Compton scattering. The system includes a high repetition rate laser adapted to direct high-energy optical pulses in a first direction in a laser cavity and a source of pulsed electron beam adapted to direct electron beam in a second direction opposite to the first direction in the laser cavity. The electron beam interacts with photons in the optical pulses in the laser cavity to produce X-rays in the second direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.