Optical recording medium, method for manufacturing the same and target used for sputtering process
US7018694B2 · kind B2 · utility
30Cited by
3References
18Claims
0Family size
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Key dates
| Filing date | Mar 22, 2004 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Aug 28, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical recording medium includes a recording layer containing an alloy represented by a general formula: (TixM1x)yM2y, where element M1 is Si or Al, element M2 is an element selected from the group consisting of Si, Al and Fe and different from the element M1, x is equal to or larger than 0.3 and equal to or smaller than 0.8, and y is equal to or larger than 0.75 and equal to or smaller than 1.The thus constituted optical recording medium only places minimal load on the global environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.