Apparatus and method for nanoscale pattern generation
US7018944B1 · kind B1 · utility
7Cited by
4References
43Claims
0Family size
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Inventor
Key dates
| Filing date | Jul 21, 2003 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Jul 21, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/893
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus that produces highly ordered, nanosized particle arrays on various substrates. These regular arrays may be used as masks to deposit and grow other nanoscale materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.