Molecular beam epitaxy equipment
US7021238B2 · kind B2 · utility
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9Claims
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Assignee
Inventors
Key dates
| Filing date | Nov 26, 2003 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Dec 5, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/406
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Epitaxy equipment including an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a section corresponding to a section of the diaphragm and a molecular beam is formed at the level of a zone surrounding the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.