Photoresists with hydroxylated, photoacid-cleavable groups
US7022457B2 · kind B2 · utility
0Cited by
4References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2003 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Sep 27, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.