Method for making thin film devices intended for solar cells or silicon-on-insulator (SOI) applications
US7022585B2 · kind B2 · utility
45Cited by
5References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 2003 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Aug 13, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76259
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In one inventive aspect, a thin film device is manufactured by (a) forming a porous semiconductor layer in the form of a thin film on an original substrate, the formation being immediately followed by (b) separation of the thin film by a lift-off process from the original substrate; (c) transfer of the thin film to a dummy support, the thin film not being attached to the dummy support; (d) fabrication of a device on top of the thin film; and (e) transfer and attachment of said device on said thin film on a foreign substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.