Method for measuring nm-scale tip-sample capacitance
US7023220B2 · kind B2 · utility
3Cited by
8References
4Claims
0Family size
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Key dates
| Filing date | Oct 19, 2004 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Oct 19, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/866
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for measuring nm-scale tip-sample capacitance including (a) measuring a cantilever deflection and a change in probe-sample capacitance relative to a reference level as a function of a probe assembly height; (b) fitting out-of-contact data to a function; (c) subtracting the function from capacitance data to get a residual capacitance as a function of the probe assembly height; and (d) determining the residual capacitance at a z-position where the cantilever deflection is zero.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.