Dip coating process for optical elements
US7025457B2 · kind B2 · utility
15Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2003 |
| Grant date | Apr 11, 2006 |
| Priority date | — |
| Expiry date | Jul 31, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/14
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A dip coating process is disclosed that provides a coating on the surfaces of an optical element with more consistent coating thickness. The objectives of this invention are accomplished by holding the coated optical element so that a meniscus is created between the element and the surface of the coating solution. At such a position, the capillary force generated by the touching meniscus helps drain down excessive coating at the bottom of the substrate to quickly yield a consistent coating thickness over the coated surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.