Source for thermal physical vapor deposition of organic electroluminescent layers
US7025832B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2003 |
| Grant date | Apr 11, 2006 |
| Priority date | — |
| Expiry date | Apr 11, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition source is provided which is installed in a chamber, heated by applied electric power to transfer heat to a vapor deposition material received therein and applying a vaporized deposition material generated therein to a substrate to form deposition organic electroluminescent layers onto the substrate. The deposition source includes a vessel formed of a top plate on which a vapor efflux aperture is formed, a side wall, and a bottom wall; a heating device that supplies heat to the deposition material received in the vessel, the heating device being capable of moving vertically; and a moving device that moves the heating device (or the bottom wall), the moving device (or the bottom wall) being operated in response to the signal of a sensing device on varied distances between the heating device and the surface of said deposition material. Thus, the heating device is moved downward (or the bottom wall) is moved upward by the moving device to maintain the distance between the heating device (or the substrate to be coated) and the surface of the deposition material at an initially-set value when the thickness of the deposition material is decreased.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.