Method for analyzing waviness of a surface
US7035761B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2004 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Aug 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B21/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for analyzing waviness of a surface. The method includes measuring a height of the surface, producing a set of data points indicative of a waviness profile, selecting a subset of the set of data points, calculating a waviness height of the subset, repeating the selecting, determining, and calculating steps for additional subsets until all members of the set of data points have been selected, and selecting a maximum waviness height value from the waviness heights calculated for each subset. The height of the surface may be measured over a distance longer than the length over which waviness assessment is required.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.