Apparatus and method for forming pattern
US7036980B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 27, 2002 |
| Grant date | May 2, 2006 |
| Priority date | — |
| Expiry date | Jul 16, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.