Patent · US Expired

Antireflection film, its production method, optical device, and image display

US7037573B2 · kind B2 · utility

22Cited by
2References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 12, 2003
Grant dateMay 2, 2006
Priority date
Expiry dateMar 12, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31663
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An antireflection layer is formed directly or through an other layer at least on one side of a transparent base film of an antireflection film. The antireflection layer is made of at least two kinds of low refractive index materials satisfying a relationship of refractive index: nd20≦1.49. The antireflection layer is excellent in antireflection characteristics and mar resistance. When the antireflection layer is formed on a hard coat layer having an uneven surface roughened by particles, the antireflection film is excellent in antiglareness.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.