Thin hafnium oxide film and method for depositing same
US7037595B1 · kind B1 · utility
4Cited by
8References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 15, 1999 |
| Grant date | May 2, 2006 |
| Priority date | — |
| Expiry date | Nov 15, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer of hafnium oxide is in amorphous form and has a density less than 8 gm/cm3. The layer is formed by depositing on a substrate without energy input to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.