Exposure apparatus
US7038759B2 · kind B2 · utility
13Cited by
17References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2002 |
| Grant date | May 2, 2006 |
| Priority date | — |
| Expiry date | Jul 3, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 MΩ·cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.