Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices
US7039889B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2003 |
| Grant date | May 2, 2006 |
| Priority date | — |
| Expiry date | Mar 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/39
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.