Flat coil and lithographic method for producing microcomponents
US7041433B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2000 |
| Grant date | May 9, 2006 |
| Priority date | — |
| Expiry date | Apr 16, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F17/0006
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a flat coil and to a lthographic method for producing microcomponents with metal component sources in the sub-millimeter range. According to the inventive method, a resist material is structured by means of selective exposition and removing the unexposed zones and filling in the gaps between the resist structures with metal by means of a galvanic method to produe the metal component structures. The aim of the invention is to improve such a method so that the microcomponents can be subdivided during said process. To this end, a structured three-dimensional sacrificial metal layer is produced during the production of the microcomponent, said sacrificial layer delimiting the microcomponent and being removed once the microcomponent is due to be subdivided. The invention also relates to a method for producing microcomponents with component structures of cross-linkable resist material and to a flat coil for micromotors with at least one coil layer with strip conductors in the sub-millimeter range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.