Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems
US7044143B2 · kind B2 · utility
17Cited by
37References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2002 |
| Grant date | May 16, 2006 |
| Priority date | — |
| Expiry date | Aug 6, 2023 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06F43/08
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the microelectronic substrate processing chamber. A detergent supply system is configured to supply detergent to the microelectronic substrate processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.