Alkali resistant polymeric interlayers for lithoplates
US7049048B2 · kind B2 · utility
6Cited by
4References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2004 |
| Grant date | May 23, 2006 |
| Priority date | — |
| Expiry date | Aug 27, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31699
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl groups substituted with three alkoxy and/or phenoxy groups. The lithographic printing plate precursors additionally comprise an imageable layer over the interlayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.