Photoresist stripping composition and cleaning composition
US7049275B2 · kind B2 · utility
21Cited by
3References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2003 |
| Grant date | May 23, 2006 |
| Priority date | — |
| Expiry date | Feb 14, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1:wherein R1 to R3 are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7:wherein R2 to R5 and n are as defined in the specification, is a novel compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.