Forming a monitoring deposit on a substrate
US7052737B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2002 |
| Grant date | May 30, 2006 |
| Priority date | — |
| Expiry date | Mar 27, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K11/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for forming a monitoring deposit on a substrate comprises determining a temperature range to subject the substrate to provide a high temperature of operation up to less than a critical substrate deterioration temperature; selecting a binder to monitor temperature by emitting an indicator within the determined temperature range; combining the indicator and the binder; and applying the combined indicator and binder to the substrate to form the monitoring deposit. An article comprises a substrate; and a combined indicator and binder applied into the substrate, wherein the binder emits the indicator within a temperature range determined to subject the substrate to high temperature operation up to less than a critical substrate deterioration temperature. Also, a method of monitoring a gas turbine system comprise selecting a binder to monitor temperature by emitting an indicator within a temperature range determined to permit subjecting a substrate in the system to high temperature operation up to less than a critical turbine substrate deterioration temperature; combining the indicator and the binder; and applying the combined indicator and binder to the substrate to form the mo…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.