Patent · US Expired

Embroidery simulation method and apparatus and program and recording medium

US7054709B2 · kind B2 · utility

5Cited by
1References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 17, 2003
Grant dateMay 30, 2006
Priority date
Expiry dateMar 17, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T2210/16
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A method for realizing embroidery simulation which can be used as an alternative sample to an actual object. A shade is added to a stitch not to brighten the center of the stitch and to darken the opposite ends thereof as shown at (a) but to brighten a stitch A close to a light source most and to darken a stitch B remote from the light source most as shown at (b). Assuming that the light source is not located on a two-dimensional plane where the stitch exists but a light beam enters obliquely from the upper space, variation of shade is also added in the widthwise direction of a yarn similarly to the longitudinal direction thereof in order to impart three-dimensional feeling thus attaining a simulation image having highly massive feeling.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.