Substrate treating compositions comprising a C7 or higher monohydric alcohol
US7056875B2 · kind B2 · utility
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10References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 5, 2004 |
| Grant date | Jun 6, 2006 |
| Priority date | — |
| Expiry date | May 6, 2024 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06M2200/20
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The present invention is directed to a composition for improving substrate characteristics. The composition has a substrate enhancing agent, like a monohydric alcohol, and the composition reduces wrinkles in substrates that have not been subjected to ironing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.