Semiconductor component, particularly a micromechanical pressure sensor
US7057248B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2002 |
| Grant date | Jun 6, 2006 |
| Priority date | — |
| Expiry date | Apr 30, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L27/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A semiconductor component, in particular a micromechanical pressure sensor based on silicon, having a base layer, an at least largely self-supporting diaphragm and an overlayer situated on the diaphragm, the diaphragm and the base layer, at least from place to place, delimiting a void. Furthermore, at least from place to place, above the diaphragm a conducting region is provided in the overlayer which is electrically poorly conductive as compared to the conducting region, to which the surface of the diaphragm that faces the overlayer is able to be electrically contacted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.