Method of making thin-film magnetic head
US7057260B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2003 |
| Grant date | Jun 6, 2006 |
| Priority date | — |
| Expiry date | Jul 23, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In the method of making a thin-film magnetic head in accordance with the present invention, an alignment mark is electrically connected to a multilayer film which will later become a TMR film. Therefore, when the alignment mark is irradiated with a position correcting electron beam in order to correct a drawing position in the subsequent step of electron beam lithography, electric charges of the electron beam flow into the multilayer film without staying in the alignment mark. As a consequence, the position correcting electron beam does not lose its straightforwardness, whereby the drawing position in electron beam lithography can be corrected accurately.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.