Patent · US Expired

Optical method and system for extended depth of focus

US7061693B2 · kind B2 · utility

200Cited by
27References
45Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 28, 2004
Grant dateJun 13, 2006
Priority date
Expiry dateDec 19, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2207/129
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.