Patent · US Expired

Multivariate statistical process monitors

US7062417B2 · kind B2 · utility

34Cited by

5References

13Claims

0Family size

Assignee

Perceptive Engineering Limited · GB

Inventors

Uwe Kruger · Mühlheim an der Donau, DE
Qian Chen · San Jose, US
David J. Sandoz · Borth, GB

Key dates

Filing date	Mar 23, 2001
Grant date	Jun 13, 2006
Priority date	—
Expiry date	Feb 25, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG06F17/18
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

An extended partial least squares (EPLS) approach for the condition monitoring of industrial processes is described. This EPLS approach provides two statistical monitoring charts to detect abnormal process behaviour as well as contribution charts to diagnose this behaviour. A theoretical analysis of the EPLS monitoring charts is provided, together with two application studies to show that the EPLS approach is either more sensitive or provides easier interpretation than conventional PLS.Generalised scores are calculated by constructing an augmented matrix, of the formZ=[Y{dot over (:)}X],where X is the predictor matrix and Y is the response matrix, and constructing a score matrix Tn=T*n−E*n in which T*n and E*n are generally of the form:the columns of the matrix T*n providing the generalised t-scores and the columns of the matrix E*n the generalised residual scores, where ℑ denotes an M×M identity matrix,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.