Patent · US Expired

Reduced loss diffractive structure

US7064899B2 · kind B2 · utility

7Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 2002
Grant dateJun 20, 2006
Priority date
Expiry dateAug 30, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B5/1809
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A sub-wavelength anti-reflective diffractive structure is incorporated with a base diffractive structure having a small period to form a high efficiency diffractive structure. In the high efficiency diffractive structure, the anti-reflective structure and/or the base diffractive structure are altered from their ideal solo structure to provide both the desired performance and minimize reflections.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.