Patent · US Expired

Method of producing a strain-sensitive resistor arrangement

US7065861B2 · kind B2 · utility

1Cited by

2References

4Claims

0Family size

Assignee

Mannesmann VDO AG · DE

Inventors

Arthur Schäfert · Schwalbach, DE
Jürgen Irion · Pocking, DE
Zlatko Penzar · Dietzenbach, DE
Wolfgang Porth · Frankfurt am Main, DE

Key dates

Filing date	Oct 27, 2004
Grant date	Jun 27, 2006
Priority date	—
Expiry date	Oct 27, 2024

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/4913
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention relates to a strain-sensitive resistor, comprising a resistance layer arranged on a support element and an electromechanical transducer produced with this resistor.An increase in the electrical measured signal picked off across the resistor is achieved in a simple way by the support element (1) having a recess (7) on its surface (9) which, when the support element (1) is subjected to mechanical stress in at least one area of the surface (9) of the support element (1) in which the resistance layer (4) is positioned, produces a ratio between the two main strain directions (L, T) of the resistance layer (4) which differs in magnitude.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.