Patent · US Expired

System and process for gas recovery

US7067087B2 · kind B2 · utility

2Cited by
8References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 23, 2002
Grant dateJun 27, 2006
Priority date
Expiry dateAug 31, 2023

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B2210/0031
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

This invention is directed to a three-stage process for recovering and purifying a helium gas, and a system for using the three-stage process. The steps comprise a) introducing a gas from a cold spray forming chamber to a particulate removing apparatus to form a particulate-free helium gas, and recycling a first portion of the particulate-free helium gas back to the chamber; b) passing a second portion of the particulate-free helium gas to a first compressor prior to passing a helium gas purification membrane to form a purified helium gas and an exhaust gas, and passing the purified helium gas to mix with the first portion of particulate-free helium gas to the chamber; and c) passing a third portion of the particulate-free helium gas to a liquid separator apparatus to remove water and a receiver to dampen any pulsations to form a liquid-free helium gas, and recycling the liquid-free helium gas to said cold spray forming chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.