Method of and apparatus for measurement and control of a gas cluster ion beam
US7067828B2 · kind B2 · utility
13Cited by
7References
34Claims
0Family size
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Inventor
Key dates
| Filing date | Jan 27, 2004 |
| Grant date | Jun 27, 2006 |
| Priority date | — |
| Expiry date | Jan 27, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus are disclosed for measuring controlling characteristics of clusters in a cluster ion beam, including average cluster ion velocity {overscore (v)}, average cluster ion mass {overscore (m)}, average cluster ion energy Ē, average cluster ion charge state {overscore (q)}, average cluster ion mass per chargeand average energy/chargeThe measurements are employed in gas cluster ion beam processing systems to monitor and control gas cluster ion beam characteristics that are critical for optimal processing of workpieces by gas cluster ion beam irradiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.