Apparatus for reducing pellicle darkening
US7068347B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 20, 2002 |
| Grant date | Jun 27, 2006 |
| Priority date | — |
| Expiry date | Dec 20, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Pellicles separated by a distance sufficient to allow a purge gas help repair damage to at least one of the pellicles caused by exposure to an incident radiation and allowing at least a minimum amount of radiation to reach a semiconductor wafer sufficient to perform a desired photolythography process. Moreover, the two pellicles separated by a sufficient distance such that a dispersed purge gas dispersed between the pellicles will not absorb more than an amount of energy from the incident radiation so as to prevent a desired amount of the radiation to reach a semiconductor wafer located a certain distance away from the pellicles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.