Acid dip for zinc-manganese alloy electrodeposition
US7070689B2 · kind B2 · utility
5Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2002 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Apr 13, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D3/565
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a dip comprising an acid aqueous solution having no ammonium ion, fluoroborate ions or citrate ion and containing per liter: between 10 and 60 g of Zn2+ ions and between 20 and 100 g of Mn2+ ions. The invention is characterised in that it comprises a buffer agent that maintains the pH at a value of between 3 and 7, preferably between 4.5 and 6 or better still between 4.8 and 5.5, and another agent, different from the buffer agent, which is used to bring together the deposition potentials of couple Zn/Zn2+ and couple Mn/Mn2+. The inventive dip used to deposit a Zn and Mn alloy by electrolysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.