Patent · US Expired

Manufacturing method of fine structure, optical element, integrated circuit, and electronic instrument

US7070701B2 · kind B2 · utility

3Cited by
5References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 8, 2003
Grant dateJul 4, 2006
Priority date
Expiry dateMar 18, 2024

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K59/122
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A fine structure manufacturing method is provided. The method comprises providing a lyophilic film on a treated surface of a substrate on which a pattern having a desired form is to be formed, providing a liquid-repellent film on an upper surface of the lyophilic film, the liquid-repellent film having liquid repellency relative to a liquid material used for forming the pattern, and eliminating a part of the liquid-repellent film located on an area where the pattern is to be formed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.