Manufacturing method of fine structure, optical element, integrated circuit, and electronic instrument
US7070701B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 8, 2003 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Mar 18, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fine structure manufacturing method is provided. The method comprises providing a lyophilic film on a treated surface of a substrate on which a pattern having a desired form is to be formed, providing a liquid-repellent film on an upper surface of the lyophilic film, the liquid-repellent film having liquid repellency relative to a liquid material used for forming the pattern, and eliminating a part of the liquid-repellent film located on an area where the pattern is to be formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.