Gallium nitride material devices including an electrode-defining layer and methods of forming the same
US7071498B2 · kind B2 · utility
133Cited by
72References
72Claims
0Family size
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Key dates
| Filing date | Dec 17, 2003 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Dec 17, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/8503
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Gallium nitride material devices and methods of forming the same are provided. The devices include an electrode-defining layer. The electrode-defining layer typically has a via formed therein in which an electrode is formed (at least in part). Thus, the via defines (at least in part) dimensions of the electrode. In some cases, the electrode-defining layer is a passivating layer that is formed on a gallium nitride material region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.