Patent · US Expired

Light emitting device methods

US7074631B2 · kind B2 · utility

41Cited by
81References
118Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 5, 2004
Grant dateJul 11, 2006
Priority date
Expiry dateApr 1, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/956

Abstract

A method includes disposing a planarization layer on a surface of a layer of semiconductor material and disposing a lithography layer on a surface of the planarization layer. The method also includes performing nanolithography to remove at least a portion of the planarization layer, at least a portion of the lithography layer and at least a portion of the layer of semiconductor material, thereby forming a dielectric function in the surface of the layer of semiconductor material that varies spatially according to a pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.