Method for manufacturing an optical compensator on a transitional substrate
US7075606B2 · kind B2 · utility
1Cited by
13References
28Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 29, 2003 |
| Grant date | Jul 11, 2006 |
| Priority date | — |
| Expiry date | Oct 14, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2413/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing an optical compensator (5) on a transitional substrate (8) comprises applying a first orientation layer (20) to the transitional substrate. The first orientation layer (20) is then aligned and a first anisotropic liquid crystal material (30) is applied on the first orientation layer. In one embodiment, a retardation layer (10) is located between the transitional substrate (8) and the first orientation layer (20).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.